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JSSC 2007第3期Memory65nmSRAM

A 256-kb 65-nm Sub-threshold SRAM Design for Ultra-Low-V oltage Operation

65纳米工艺下256kb亚阈值SRAM设计,支持超低电压工作至400mV以下
256kb, 65nm CMOS, <400mV
SRAM亚阈值低电压65纳米功耗优化
提出新型位单元设计,支持更低电压工作
探索6T SRAM在超低电压下的工作极限
实现亚阈值电压下的功耗与能量优化
Abstract
Low-voltage operation for memories is attractive because of lower leakage power and active energy, but the chal- lenges of SRAM design tend to increase at lower voltage. This paper explores the limits of low-voltage operation for traditional six–transistor (6 T) SRAM and proposes an alternative bitcell that functions to much lower voltages. Measurements confirm that a 256-kb 65-nm SRAM test chip using the proposed bitcell operates into sub-threshold to below 400 mV. At this low voltage, the memory offers substantial power and energy savings at the cost of speed, making it well-suited to energy-constrained applications. The paper provides measured data and analysis on the limiting effects for voltage scaling for the test chip.