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JSSC 2007第5期Other深亚微米

Analytical Determination of MOSFET’s High-Frequency Noise Parameters From NF /53/48 Measurements and Its Application in RFIC Design

提出一种通过噪声系数测量确定MOSFET高频噪声参数的解析方法
高频50Ω噪声系数测量
噪声参数MOSFET高频噪声噪声系数射频集成电路
基于噪声系数测量的解析方法
直接提取最小噪声系数和等效噪声电阻
适用于深亚微米MOSFET的噪声参数预测
Abstract
An analytical method, along with closed-form solu- tions, to determine high-frequency (HF) noise parameters of the MOSFET from its noise figure (NF) measurements with an ar- bitrary source impedance is presented and experimentally veri- fied. This method allows for the determination of the minimum noise figure, NF /109/105/110, equivalent noise resistance, , and optimum source admittance , of MOSFET directly from a single high- frequency 50-/10noise figure measurement and a model character- ization based on the transistor’s measured scattering parameters. The proposed method can accurately predict the noise parameters of deep-submicron MOSFETs, and hence is useful in the design of low-noise radio-frequency integrated circuits (RFICs). Application of the proposed method in the design of CMOS RF low-noise am- plifiers (LNAs) is also discussed.