Abstract
Inductive coupling is becoming a design concern
for global interconnects in nanometer technologies. We present
measurement results of the effect of inductive coupling on timing,
and demonstrate that inductive coupling noise is a practical design
issue in 90 nm technology. The measured delay change curve is
consistent with circuit simulation results for an RLC interconnect
model, and clearly different from those for a conventional RC
model. The long-range coupling effect of inductive coupling,
an