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Rail-to-Rail, Linear Hot-Electron Injection Programming of Floating-Gate V oltage Bias Generators at 13-Bit Resolution Chenling Huang
提出一种线性热电子注入技术,简化编程过程,实现超过13位精度的浮动栅电压编程。
编程精度大于13位,注入速率可控范围0.1至4.1V
热电子注入浮动栅电压编程精度反馈电路CMOS
▸创新点1:线性热电子注入技术(方法创新)。该技术通过消除传统脉冲宽度和幅度的非线性调整,实现了注入过程的线性化,编程精度超过13位,显著提高了电压参考的准确性和可重复性。
▸创新点2:主动反馈电路设计(电路创新)。采用反馈机制动态稳定注入过程中的非线性因素(如温度、工艺偏差),确保注入速率恒定,简化了校准流程并提升了系统可靠性。
▸创新点3:简化的编程流程(系统创新)。通过线性化注入和反馈控制,省去了传统复杂的预测模型和多次迭代步骤,使编程时间缩短至50ms脉冲内完成,支持0.1V至4.1V的宽范围电压编程。
▸创新点4:高精度与宽动态范围(性能创新)。实测注入速率可调范围达6.9至250V/s,且在0.5μm CMOS工艺下实现,兼顾了低功耗(未明确数据)与高分辨率(13-bit以上)的平衡。
Abstract
Hot-electron injection is widely used for accurate pro- gramming of on-chip floating-gate voltage and current reference s. The conventional programming approach involves adapting the duration and magnitude of the injec t i o np u l s e sb a s e do nap r e d i c - tive model which is estimated by using measured data. However, varying the pulse-widths or amplitu des introduces nonlinearity in the injection process which complic ates the modeling, calibration and programming procedure. In this paper, we propose a linea r hot-electron injection technique which signi ficantly simpli fies the programming procedure, and can achieve programming accuracy greater than 13-b which is limited by the thermal noise from the in- jection process. The procedure emp loys an active feedback circuit which ensures that all the nonlinear factors affecting the hot-elec- tron injection process are held constant, thus ac hieving a stable and controllable injection rate. Measured results using an array of floating-gate voltage reference prototyped in a 0.5- ms t a n d a r d CMOS process demonstrate that the injecti on rates can be con- trolled from 0.1 to 4.1 V for the programmable voltage range. Using 50-ms injection pulses, we show that the average injection rate can be adapted from 6.9 to 250 V .