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A Scaling Roadmap and Performance Evaluation of In-Plane and Perpendicular MTJ B
本文研究了从65nm到8nm工艺节点下平面和垂直MTJ STT-MRAM的可扩展性及读写性能。
10年保留时间的热稳定因子
STT-MRAMMTJ可扩展性读写性能蒙特卡洛仿真
▸采用精确的MTJ宏模型进行高效蒙特卡洛仿真
▸利用ITRS预测的晶体管参数校准外围电路
▸提出恒定缩放方案优化STT-MRAM读写平衡
Abstract
This paper explores the scalability of in-plane and
perpendicular MTJ based STT-MRAMs from 65 nm to 8 nm
while taking into consideration re alistic variability effects. We
focus on the read and write performances of a STT-MRAM based
cache rather than the obvious advantages such as the denser
bit-cell and zero static power. An accurate MTJ macromodel
capturing key MTJ properties was adopted for ef ficient Monte
Carlo simulations. For the simulation of access devices and pe-
ripheral circuitries, I