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JSSC 2013第2期Memory65nm至8nmEmerging Memory

A Scaling Roadmap and Performance Evaluation of In-Plane and Perpendicular MTJ B

本文研究了从65nm到8nm工艺节点下平面和垂直MTJ STT-MRAM的可扩展性及读写性能。
10年保留时间的热稳定因子
STT-MRAMMTJ可扩展性读写性能蒙特卡洛仿真
采用精确的MTJ宏模型进行高效蒙特卡洛仿真
利用ITRS预测的晶体管参数校准外围电路
提出恒定缩放方案优化STT-MRAM读写平衡
Abstract
This paper explores the scalability of in-plane and perpendicular MTJ based STT-MRAMs from 65 nm to 8 nm while taking into consideration re alistic variability effects. We focus on the read and write performances of a STT-MRAM based cache rather than the obvious advantages such as the denser bit-cell and zero static power. An accurate MTJ macromodel capturing key MTJ properties was adopted for ef ficient Monte Carlo simulations. For the simulation of access devices and pe- ripheral circuitries, I