← 返回 JSSC 论文列表JSSC 2013第9期Memory40nmSRAM
A 6T-SRAM With a Post-Process Electron Injection Scheme That Pinpoints and Simul
提出一种针对6T-SRAM的后处理电子注入方案,精准修复低读取干扰容限单元。
40nm CMOS, 57% BL延迟降低, 31%读取能耗降低, 32~256倍注入时间缩短, 3%面积减少
6T-SRAM后处理电子注入读取干扰容限能效优化CMOS工艺
▸精准定位并同时修复低读取干扰容限单元
▸仅对强通过栅晶体管注入电子
▸相比传统方案显著提升性能指标
Abstract
A post-process carrier injection scheme for 6T-SRAM
is proposed. The proposed scheme pinpoints and simultaneously
repairs only cells that have low read disturb margin by injecting
electrons to the strong pass gate transistor. Compared with the con-
ventional electron injection scheme that injects electrons to either
side of the pass gate transistor o f all cells, the proposed scheme
achieves 57% less BL delay, 31% less read energy, 32 ~ 256 times
shorter injection time and 3% are a reduction. Th