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JSSC 2013第9期Memory40nmSRAM

A 6T-SRAM With a Post-Process Electron Injection Scheme That Pinpoints and Simul

提出一种针对6T-SRAM的后处理电子注入方案,精准修复低读取干扰容限单元。
40nm CMOS, 57% BL延迟降低, 31%读取能耗降低, 32~256倍注入时间缩短, 3%面积减少
6T-SRAM后处理电子注入读取干扰容限能效优化CMOS工艺
精准定位并同时修复低读取干扰容限单元
仅对强通过栅晶体管注入电子
相比传统方案显著提升性能指标
Abstract
A post-process carrier injection scheme for 6T-SRAM is proposed. The proposed scheme pinpoints and simultaneously repairs only cells that have low read disturb margin by injecting electrons to the strong pass gate transistor. Compared with the con- ventional electron injection scheme that injects electrons to either side of the pass gate transistor o f all cells, the proposed scheme achieves 57% less BL delay, 31% less read energy, 32 ~ 256 times shorter injection time and 3% are a reduction. Th