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JSSC 2014第1期Digital Circuits90nm

A 0.15-mm-Thick Noncontact Connector for MIPI Using a V ertical Directional Coupler Atsutake Kosuge, Student Member , IEEE, Wataru Mizuhara , Student Member , IEEE, Tsunaaki Shidei, Tsutomu Takeya, Student Member , IEEE

开发了一种用于MIPI应用的0.15毫米厚非接触连接器,采用垂直定向耦合器实现双链路通信。
2.3 Gb/s/link, 1.47 pJ/b, 320 ps (64% U.I.)单链路, 305 ps (61% U.I.)双链路
非接触连接器MIPI垂直定向耦合器电磁干扰抑制高速数据传输
创新点1:方法创新 - 开发了全球首个0.15毫米厚的非接触连接器,采用垂直定向耦合器(VDC)技术,显著减小了连接器的厚度,适用于超薄移动设备。
创新点2:电路创新 - 使用全平衡脉冲发射器,基于90纳米CMOS技术,有效抑制了电磁干扰(EMI),符合MIPI标准要求,提升了信号传输的稳定性。
创新点3:系统创新 - 实现了双链路通信,通过单个耦合器同时传输两路信号,且未导致显著的性能下降,最大数据速率达到2.3 Gb/s/link,功耗仅为1.47 pJ/b。
创新点4:性能创新 - 在2.0 Gb/s速率下,单链路的时序裕量为320 ps(64% U.I.),双链路的时序裕量为305 ps(61% U.I.),确保了高速数据传输的可靠性。
Abstract
A noncontact and housing-less thin–thick connecting method was developed for mobile indus try processor inter- face (MIPI) applications. This paper describes the world’s first 0.15-mm-thick connect or using a vertical directional coupler (VDC) which enables simultane ous two-link communication with one coupler without fatal performance degradation. We have analyzed the conditions for isolating two links in a coupler, and t h ed e s i g nm e t h o di sd i s c u s sed. A fully balanced pulse transmitter implemented in 90-nm CMOS technology signi ficantly suppressed electromagnetic interference (EMI), which agrees well with MIPI requirements. An exper imental liquid crystal display interface system reached a maximum data rate of 2.3 Gb/s/link at a bit error rate of less than and a power consumption of 1.47 pJ/b. The timing margin of s ingle link was 320 ps ( 64% U.I.) and of two links was 305 ps ( 61% U.I.) at 2.0 Gb/s.