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A Versatile CMOS Transistor Array IC for the Statistical Characterization of Time-Zero Variability, RTN, BTI, and HCI Javier Diaz-Fortuny , Javier Martin-Martinez , Rosana Rodriguez , Rafael Castro-Lopez , Elisenda Roca , Xavier Aragones , Enrique Barajas , Diego Mateo , Francisco V . Fernandez , and
一种用于统计表征CMOS晶体管变异性的多功能阵列芯片。
1.2-V, 65-nm CMOS, 3136 MOS transistors, 1800 × 1800 µm²
CMOS晶体管阵列统计表征时间零点变异随机电报噪声偏置温度不稳定性
▸集成3136个MOS晶体管,支持多种变异源统计表征
▸支持大规模并行老化测试,显著缩短统计表征时间
▸高精度测试架构,满足多种变异效应表征需求
Abstract
Statistical characterization of CMOS transistor variability phenomena in modern nanometer technologies is key for accurate end-of-life prediction. This paper presents a novel CMOS transistor array chip to statistically characterize the effects of several critical variability sources, such as time-zero variability (TZV), random telegraph noise (RTN), bias tempera- ture instability (BTI), and hot-carrier injection (HCI). The chip integrates 3136 MOS transistors of both pMOS and nMOS types, with eight different sizes. The implemented architecture provides the chip with a high level of versatility, allowing all required tests and attaining the level of accuracy that the characterization of the above-mentioned variability effects requires. Another very important feature of the array is the capability of performing massively parallel aging testing, thus significantly cutting down the time for statistical characterization. The chip has been fabricated in a 1.2-V , 65-nm CMOS technology with a total chip area of 1800 × 1800 µm 2.