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JSSC 2020第6期Memory130nmSRAM

A 373-F 2 0.21%-Native-BER EE SRAM Physically Unclonable Function With 2-D Power-Gated Bit Cells and V SS Bias-Based Dark-Bit Detection Kunyang Liu , Student Member , IEEE, Y ue Min, Xuan Y ang

提出一种基于EE结构的高稳定SRAM PUF,采用2-D电源门控技术降低功耗并提高抗攻击能力。
130nm CMOS, 0.8V, 0.21% BER, 128fJ/bit, 0.44pW/bit
SRAM PUFEE结构2-D电源门控暗位检测低功耗
创新点1:EE结构位单元提高原生稳定性(方法创新) - 采用增强-增强(EE)结构的SRAM位单元设计,通过优化晶体管阈值电压匹配和电流路径,显著提升PUF原生稳定性,实测原生误码率(BER)低至0.21%,较传统SRAM PUF提升14倍。
创新点2:2-D电源门控技术降低功耗(电路创新) - 提出二维电源门控架构,通过动态控制位单元供电网络,使PUF在非工作状态下完全关闭,静态功耗降至0.44 pW/bit,工作能耗仅128 fJ/bit,同时增强抗侧信道攻击能力。
创新点3:基于VSS偏置生成器的暗位检测技术(系统创新) - 集成轻量级VSS偏置发生器,通过电压/温度(VT)漂移监测识别不稳定位单元(暗位),结合掩码技术实现100%错误消除,在-40°C至120°C和0.8-1.4V条件下保持零误码。
创新点4:nMOS-only紧凑型位单元设计(工艺创新) - 采用纯nMOS晶体管架构实现373F²的超小面积位单元,通过消除PMOS器件简化工艺复杂度,同时维持EE结构的稳定性优势,适合高密度PUF阵列集成。
Abstract
This article presents a highly stable SRAM-based physically unclonable function (PUF) using enhancement– enhancement (EE)-structure bit cells for native stability improve- ment. The PUF bit cells are power-gated 2-D and are normally in the OFF state, which largely reduces power and is beneficial to attack tolerance. In addition, a dark-bit detection technique based on a lightweight integrated V SS-bias generator is imple- mented in order to screen out potentially unstable bit cells (dark bits) induced by supply voltage/temperature (VT) variations and other factors. Measured native bit error rate (BER) of prototype chips fabricated in 130-nm standard CMOS is 0.21% at 0.8 V and 23 ◦C, which is 14 × better compared with the conventional SRAM-based PUF. After masking the detected dark bits, no bit error (3339 bits × 500 evaluations) appeared at the worst VT corner across 0.8 to 1.4 V and −40 ◦C to 120 ◦C. This technique also eliminated all unstable bits in the accelerated aging test. Both the data before and after dark-bit masking have passed all applicable NIST SP 800-22 randomness tests. The measured operational energy at 0.8 V is 128 fJ/bit and the standby power is 0.44 pW/bit, thanks to the 2-D power-gating scheme. The nMOS-only bit cell is highly compact, with a normalized bit cell area of 373 F 2.