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JSSC 2023第11期Memory65nm

An Energy-Efficient Design of TSV IO for HBM With a Data Rate up to 10 Gbs Ji-Yo

提出一种低功耗TSV I/O设计,用于HBM,数据速率达10Gb/s。
65nm CMOS, 0.179–0.185 pJ/b/pF, 5–10 Gb/s
TSV I/O高带宽内存低功耗信号完整性PVT变化
采用低电源电压(VDDL)实现低功耗
预驱动器和主驱动器提升信号完整性
无模拟参考电压的1-to-4解复用比较器
Abstract
In this study, a low-power through-silicon via (TSV) I/O employing a low supply voltage (VDDL) for low-power oper- ation with a 65-nm complementary metal–oxide–semiconductor (CMOS) process is proposed for high-bandwidth memory (HBM). The proposed TSV I/O satisfies the following requirements for implementing HBM I/O: a sufficient voltage margin of the transmitted signal, no static power consumption, and a small area overhead. For the improvement of the signal integrity (SI) under (VDDL) operation