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JSSC 2023第11期Other180nm

Subtractive Photonics in Bulk CMOS Craig Ives

提出在体CMOS工艺中通过减色法实现光子波导的新方法。
1550nm多模波导损耗4.1dB/cm
减色光子学体CMOS悬浮波导湿法刻蚀光电集成
利用后端金属和玻璃层图案化实现悬浮介质波导
通过简单湿法刻蚀获得可见光至近红外波段低损耗波导
在180nm CMOS工艺中实现光电系统兼容性验证
Abstract
Subtractive photonics is presented as a method for implementing photonic waveguides into any bulk CMOS or electronics process. Metal and glass are patterned in the backend layers by the foundry to reveal suspended dielectric waveguides when the metal is etched away. This method requires a simple wet etch and provides waveguiding of light up to the visible regime using the broad transparency windows of silicon oxides. Mechanical, chemical, and photonic considerations are discussed, and photonic d