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该论文提出了一种在65nm CMOS工艺中实现的基于NPN管的温度传感器,通过批量校准和修调技术,在-70°C至125°C范围内分别实现了±0.5°C和±0.2°C(3σ)的高精度,解决了深亚微米工艺中温度传感器精度不足的问题。
Salvatore Drago1,3, Domine M. W, Leenaerts1, Bram Nauta3 1 NXP Semiconductors, Eindhoven, Netherlands Delft University of Technology, Delft, Netherlands 3 University of Twente, Enschede, Netherlands 2 This paper describes a temperature sensor realized in a 65nm CMOS process with a batch-calibrated inaccuracy of ±0.5°C (3σ) and a trimmed inaccuracy of ±0.2°C (3σ) from –70°C to 125°C. This represents a 10-fold improvement in accuracy compared to other deep-submicron temperature sensors [1,2], and is comparable with that of state-of-the-art sensors implemented in larger-featuresize processes [3,4]. The sensor draws 8.3µA from a 1.2V supply and occupies an area of 0.1mm2, which is 45 times less than that of sensors with comparable accuracy [3,4]. These advances are enabled by the use of NPN transistors as sensing elements, the use of dynamic techniques i.e. correlated double sampling (CDS) and dynamic element matching (DEM), and a single room-temperature
Fabio Sebastiano1,2, Lucien J. Breems1, Kofi A. A. Makinwa2,