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本文提出了一种在3nm GAA工艺中使用0.7V薄栅氧晶体管实现的耐高压自举模拟采样器,解决了该工艺缺乏厚栅氧晶体管而无法直接采样1.2V输入的问题,应用于12-bit SAR ADC。
process utilizing the Multi-Bridge-Channel-FET (MBCFET) with nanosheet technology enhances performance, power efficiency, and area (PPA) benefits by large effective channel width and enhanced design flexibility compared to the previous FinFET technology [1]. However, the 3nm GAA process provides only thin-gate oxide transistors for a 0.7V low supply voltage and does not offer thick-gate oxide transistors for higher supply voltages. Typically, a general-purpose analog-to-digital converter (ADC) needs to sample inputs at higher levels, such as 1.2V, over the 0.7V low supply voltage (VDD) in the 3nm GAA process. However, a conventional bootstrapped sampler can sample inputs only up to VDD level, using 2×VDD internal node voltages. In the previous FinFET
Sangheon Lee, Jinwoo Park, Junsang Park, Sangkyu Lee, Jungho Lee,
Youngjae Cho, Michael Choi, Jongshin Shin Samsung Electronics, Hwaseong, Korea Recently, as process refinement continues, the latest 3nm Gate-All-Around (GAA)