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ISSCC 2008Session 13 · MOBILE PROCESSINGDigital Processors45nm Hi-κ Metal Gate CMOS

A Sub-1W to 2W Low-Power IA Processor for Mobile Internet Devices and Ultra-Mobile PCs in 45nm Hi-κ Metal Gate CMOS

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📋 论文概要

该论文介绍了一款专为移动互联网设备和超移动PC设计的低功耗IA处理器,采用45nm Hi-κ金属栅极CMOS工艺,功耗范围在1W到2W之间。通过in-order双发射双线程流水线、独立整数/浮点执行单元以及优化的缓存架构,实现了与主流UMPC相当的性能,同时显著降低了平均功耗。

💡 主要创新点

工艺节点
45nm Hi-κ Metal Gate CMOS
重要性
发表年份
ISSCC 2008

🏷 关键词

低功耗处理器移动互联网设备45nm CMOS

📄 原文摘要

specifically designed for Mobile Internet Devices (MID) and UltraMobile PCs (UMPC) where average power consumed is in the order of a few hundred mW (as measured by MobileMark’05 OP @ 60 nits brightness) with performance similar to mainstream Ultra-Mobile PCs. The design consists of an in-order pipeline capable of issuing 2 instructions per cycle supporting 2 threads, 32KB instruction and 24KB data L1 caches, independent integer and floating point execution units, ×86 front end execution unit, a 512KB L2 cache and a 533 MT/s dual-mode (GTL and CMOS) front-side-bus (FSB); a block diagram is shown in Fig. 13.1.1. The design contains 47M transistors in a die size under 25mm2 manufactured in a 9-metal 45nm CMOS process with optimized transistors for low leakage [1] packaged in a

👥 作者与机构

Gianfranco Gerosa, Steve Curtis, Mike D’Addeo, Bo Jiang,

Belliappa Kuttanna, Feroze Merchant, Binta Patel, Mohammed Taufique, Haytham Samarchi Intel, Austin, TX This paper describes a low-power Intel® Architecture (IA) processor

分类:Digital Processors · 年份:ISSCC 2008