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本文提出一种采用非对称单元β比6T存储单元的单电源供电64kB SRAM,在45nm bulk CMOS工艺下实现0.7V供电、1GHz操作。通过细粒度位线分段架构和非对称单元设计,解决了低电压下高速SRAM的面积和性能折衷问题,相比传统对称单元节省22%面积。
A. Tohata2, T. Sasaki1, A. Katayama1, G. Fukano1, Y. Fujimura1, N. Otsuka1 1 Toshiba Semiconductor, Kawasaki, Japan Toshiba Microelectronics, Kawasaki, Japan 2 A single-power supply 64kB SRAM is fabricated in a 45nm bulk CMOS technology. The SRAM operates at 1GHz with a 0.7V supply using a fine-grained bitline segmentation architecture and with an asymmetrical unit-β-ratio 6T cell. With the asymmetrical cell, we save 22% cell area compared to a conventional symmetrical cell. This bulk SRAM is designed for GHz-class sub-1V operation (Fig. 21.4.1). Low-voltage SRAM is one of the most important components of low-power mobile products, such as cell phones and mobile game machines, which often process large amounts of data. This creates demand for high-performance SRAM that supports low-voltage operation. However, ensuring the functionality and performance of SRAM is becoming more difficult because of the larger characteristic variability on cell transistors caused by technology scaling.
A. Kawasumi1, T. Yabe1, Y. Takeyama1, O. Hirabayashi1, K. Kushida1,