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ISSCC 2008Session 21 · SRAMMemory45nm bulk CMOS

A Single-Power-Supply 0.7V 1GHz 45nm SRAM with An Asymmetrical Unit-β-ratio Memory Cell

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📋 论文概要

本文提出一种采用非对称单元β比6T存储单元的单电源供电64kB SRAM,在45nm bulk CMOS工艺下实现0.7V供电、1GHz操作。通过细粒度位线分段架构和非对称单元设计,解决了低电压下高速SRAM的面积和性能折衷问题,相比传统对称单元节省22%面积。

💡 主要创新点

核心指标
1GHz @ 0.7V, 64kB
工艺节点
45nm bulk CMOS
重要性
发表年份
ISSCC 2008

🏷 关键词

SRAM低电压非对称单元细粒度位线分段45nm

📄 原文摘要

A. Tohata2, T. Sasaki1, A. Katayama1, G. Fukano1, Y. Fujimura1, N. Otsuka1 1 Toshiba Semiconductor, Kawasaki, Japan Toshiba Microelectronics, Kawasaki, Japan 2 A single-power supply 64kB SRAM is fabricated in a 45nm bulk CMOS technology. The SRAM operates at 1GHz with a 0.7V supply using a fine-grained bitline segmentation architecture and with an asymmetrical unit-β-ratio 6T cell. With the asymmetrical cell, we save 22% cell area compared to a conventional symmetrical cell. This bulk SRAM is designed for GHz-class sub-1V operation (Fig. 21.4.1). Low-voltage SRAM is one of the most important components of low-power mobile products, such as cell phones and mobile game machines, which often process large amounts of data. This creates demand for high-performance SRAM that supports low-voltage operation. However, ensuring the functionality and performance of SRAM is becoming more difficult because of the larger characteristic variability on cell transistors caused by technology scaling.

👥 作者与机构

A. Kawasumi1, T. Yabe1, Y. Takeyama1, O. Hirabayashi1, K. Kushida1,

分类:Memory · 年份:ISSCC 2008