⚡ 本页包含 AI 生成的分析内容,仅供参考
该论文提出了一种使用可重写固态电解质开关的可编程单元阵列,并将其集成在90nm CMOS工艺中,旨在解决基于SRAM的FPGA因待机漏电流和阈值电压变化导致的功耗和面积挑战。通过后道工序器件集成,缩小了FPGA与基于单元ASIC之间的性能差距。
Toshitsugu Sakamoto1, Koichiro Okamoto1, Naoki Banno1, Shinji Ishida1, Kimihiko Ito1, Hiromitsu Hada1, Noboru Sakimura1, Tadahiko Sugibayashi1, Masato Motomura2 1 NEC, Sagamihara, Japan, NEC, Kawasaki, Japan 2 Programmable devices such as SRAM-based FPGAs have the major challenges of power consumption and circuit area due to the excessive standby leakage current and the threshold voltage variation in highly scaled SRAM. Back-end-of-line (BEOL) device, which is integrated in the interconnect layers, is attractive for reducing the performance gap between FPGA and cell-based ASIC [1-4]. In this paper, we demonstrate the fundamental operations of a programmable cell array and a 32×32 crossbar switch using a nonvolatile and rewritable solid-electrolyte switch (nanobridge or NB). A 72% reduction in chip-area compared with that of a standard-cell-based design is achieved on a 90nm CMOS platform.
Makoto Miyamura1, Shogo Nakaya2, Munehiro Tada1,