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本文提出了一种细丝缩放成形技术和电平验证写入方案,用于提高ReRAM的耐久性,实现了超过10^7次循环的耐久性。该技术解决了ReRAM在嵌入式MCU和SoC应用中需要高耐久性的问题。
Ryotaro Azuma1, Yuhei Yoshimoto1, Kouhei Tanabe2, Zhiqiang Wei1, Takeki Ninomiya1, Koji Katayama1, Ryutaro Yasuhara1, Shunsaku Muraoka1, Atsushi Himeno1, Naoki Yoshikawa1, Hideaki Murase1, Kazuhiko Shimakawa1, Takeshi Takagi1, Takumi Mikawa1, Kunitoshi Aono1 Panasonic, Kyoto, Japan, Panasonic, Nagaokakyo, Japan 1 2 Resistive RAM (ReRAM) has been recently developed for applications that require higher speed and lower voltage than Flash memory is able to provide. One of the applications is micro-controller units (MCUs) or SoCs with several megabits of embedded ReRAM. Another is solid-state drives (SSDs) where a combination of higher-density ReRAM and NAND flash memory would achieve high-performance and high-reliability storage [1], suitable for server applications for future cloud computing. ReRAM is attractive for several reasons. First, it operates at high speed and low voltage. Second, it enables high density due to
Akifumi Kawahara1, Ken Kawai1, Yuuichirou Ikeda1, Yoshikazu Katoh1,