← 返回论文列表 📄 下载原文 PDF  ISSCC 2016 · 25.1
ISSCC 2016Session 25 · mm-WAVE THz SENSINGmm-Wave0.13µm SiGe BiCMOS

A Fully Integrated 0.55THz Near-Field Sensor with a Lateral Resolution down to 8µm in 0.13µm SiGe BiCMOS

⚡ 本页包含 AI 生成的分析内容,仅供参考

📋 论文概要

本文提出了一款全集成0.55THz近场传感器,采用0.13µm SiGe BiCMOS工艺实现。该传感器通过近场探测突破了传统太赫兹成像的衍射极限,实现了8µm的横向分辨率,并消除了外部照明带来的远场背景杂散干扰。

💡 主要创新点

核心指标
8µm lateral resolution @ 0.55THz
工艺节点
0.13µm SiGe BiCMOS
重要性
发表年份
ISSCC 2016

🏷 关键词

太赫兹近场传感器SiGe BiCMOS高分辨率成像

📄 原文摘要

IHP, Frankfurt, Germany 1 2 Silicon technologies have already been employed in state-of-the-art THz imagers. However, their optical resolution was restricted to millimeters by the diffraction limit [1,2], and THz super-resolution imagers were implemented in aperture or apertureless scanning near-field optical microscopy [3]. Such systems are limited to a single pixel with an illumination source and detector components placed remotely from the near-field sensing area. The resulting dynamic range and imaging contrast are very poor, masked by a far-field background clutter of an external illumination, and requiring long integration-time cooled detectors and high-power source components [3]. We present a room-temperature near-field sensor with illumination, evanescentfield sensing, and detection on a single chip (Fig. 25.1.1). It is operated differentially around 533 to 555GHz in 0.13μm SiGe HBT technology (ft /fmax of

👥 作者与机构

Janusz Grzyb1, Bernd Heinemann2, Ullrich R. Pfeiffer1

University of Wuppertal, Wuppertal, Germany,

分类:mm-Wave · 年份:ISSCC 2016