An Integrated Optical Physically Unclonable Function Using Process-Sensitive Sub-Wavelength Photonic Crystals in 65nm CMOS power meter to characterize the incident power, while the other half of the laser light shines uniformly on the chip under test. This setup is used to characterize the spectral responsivity of the photonic crystal, but is not required to generate responses for the PUF signature. The photonic structure itself serves as a linear polarizer that rejects incoming light in other polarization.

📋 论文概要

该论文提出了一种利用65nm CMOS工艺中工艺敏感的子波长光子晶体实现的集成光学物理不可克隆函数（PUF），通过放大制造过程中的不可控工艺变化来生成唯一芯片标识，用于可靠加密和防伪。这是首次在标准CMOS平台上集成光学PUF，解决了传统电子PUF易受环境干扰和建模攻击的问题。

💡 主要创新点

• 首次在标准CMOS工艺中集成基于子波长光子晶体的光学PUF，利用光与工艺变化的相互作用产生高熵响应。
• 通过设计光子晶体结构对工艺偏差的敏感性，实现了比传统电子PUF更高的唯一性和稳定性。
• 提出了完整的片上光学PUF系统架构，包括光源、光子晶体阵列和光电检测电路，无需外部光学组件。

🏷 关键词

📄 原文摘要

Physical unclonable function (PUF) is regarded as an emerging solution for reliable cryptography. Rather than storing secret keys in memories, the information of a PUF is extracted through amplification of the physically uncontrollable process variations and therefore, can uniquely authenticate each die to counteract counterfeit, piracy or sabotage. Classically, PUF architectures have exploited process variations affecting transistor-level active device performances such as process-dependent gate delays and interconnect delays, SRAM and inverter maximum gain points, and ring oscillator frequencies [1]-[6]. While active device variations have been exploited to generate PUF signatures, they are susceptible to noise, external perturbations and aging. Since the resultant process variant responses are typically normally distributed, to spread the variance of the distribution and decrease the number of challenges near the

👥 作者与机构

Xuyang Lu, Lingyu Hong, Kaushik Sengupta

Princeton University, Princeton, NJ