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ISSCC 2023Session 28 · HIGH-DENSITY MEMORIES AND HIGH-SPEED INTERFACERF & Wireless4nm

A 4nm 1.15TB/s HBM3 Interface with Resistor-Tuned Offset-Calibration and In-Situ Margin-Detection

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📋 论文概要

本文提出一种基于4nm工艺的HBM3 DRAM接口,采用电阻调谐偏移校准和原位裕度检测技术,实现了1.15TB/s的高带宽,解决了高带宽内存接口的瓶颈问题。

💡 主要创新点

核心指标
1.15TB/s
工艺节点
4nm
重要性
发表年份
ISSCC 2023

🏷 关键词

HBM3接口偏移校准裕度检测高带宽

📄 原文摘要

Shinyoung Yi, Won Lee, Dongha Kim, Taekyung Yeo, Kyeongkeun Kang, Sangsoo Park, Eunsu Kim, Sukhyun Jung, Sanghune Park, Sungcheol Park, Mijung Noh, Hyogyuem Rhew, Jongshin Shin Samsung Electronics, Hwaseung, Korea A critical performance bottleneck for memory-bound applications such as highperformance computing (HPC), artificial intelligence (AI), and machine learning (ML) applications is the limited memory bandwidth [1]. An HBM3 DRAM interface, based on a WDQS-clocking scheme with high-speed low-voltage-swing terminated logic (LVSTL) I/O, is a promising energy-efficient high-bandwidth solution. The WDQS-clocking scheme is expected to improve the read-valid-window margin (VWM), which is a major limiting factor in achieving DRAM access reliability at high speed. However, the long turn-around read path limits the read VWM improvement. In addition, it is essential to minimize interface area for clustered channel implementations by considering controllers,

👥 作者与机构

Kwanyeob Chae, Jiyeon Park, Jaegeun Song, Billy Koo, Jihun Oh,

分类:RF & Wireless · 年份:ISSCC 2023