⚡ 本页包含 AI 生成的分析内容,仅供参考
本文提出了一款基于4nm工艺的SRAM数字存内计算宏,支持位宽灵活性,实现了6163 TOPS/W/b的能效和4790 TOPS/mm²/b的面积效率。通过混合阈值电压设计和加法器树流水线优化,平衡了性能与漏电。
Chao-Kai Chuang1, Takeshi Hashizume2, Hao-Chun Tung1, Yao-Yi Liu1, Shin-Rung Wu1, Kerem Akarvardar3, Tan-Li Chou1, Hidehiro Fujiwara1, Yih Wang1, Yu-Der Chih1, Yen-Huei Chen1, Hung-Jen Liao1, Tsung-Yung Jonathan Chang1 Figure 7.4.3 describes the overall layout floorplan, the transistor threshold voltage (Vt) selection, and the adder tree pipeline. In the DCIM, the MAC array uses a mixed-Vt design to balance performance and leakage; We checked device count and gate delay in the local adders and global adders to place mixed-Vt devices in adder tree. Due to the tree structure of adder, the SRAM bit cell array and adders in the early stage of the adder tree occupies >75% of total device in adder tree. Therefore, we use high-Vt devices for the SRAM array and local adders to reduce leakage. On the other hand, low-Vt devices are used in other portions of adder: semi-global and global adders, shifter, and accumulator.
Haruki Mori1, Wei-Chang Zhao1, Cheng-En Lee1, Chia-Fu Lee1, Yu-Hao Hsu1,